Monte Carlo Modeling of Heat Generation in Electronic Nanostructures
نویسندگان
چکیده
This work develops a Monte Carlo (MC) simulation method for calculating the heat generation rate in electronic nanostructures. Electrons accelerated by the electric field scatter strongly with optical phonons, yet heat transport in silicon occurs via the faster acoustic modes. The MC method incorporates the appropriate energy transfer rates from electrons to each phonon branch. This accounts for the non-equilibrium energy exchange between the electrons and phonon branches. Using the MC method with an electron energy-dependent scattering rate intrinsically accounts for the non-locality of the heat transfer near a strongly peaked electric field. This approach provides more information about electronically generated heat at nanoscale dimensions compared to traditional macroscopic field-dependent methods. The method has applications in any region of high spatial or temporal non-equilibrium between electrons and phonons, and particularly facilitates careful microscopic analysis of heating in a nanoscale transistor. NOMENCLATURE Λ phonon mean free path Cs heat capacity per unit volume ks thermal conductivity T lattice temperature Q′′′ heat generation rate per unit volume τph phonon-phonon scattering time u phonon energy density per unit volume and unit solid angle uo equilibrium phonon energy density v phonon velocity J electron current density E electric field LA longitudinal acoustic TA transverse acoustic LO longitudinal optical TO transverse optical h̄ Planck’s constant divided by 2π k electron wave vector Γ(k) electron-phonon scattering rate M(k) electron-phonon matrix element Ek electron energy g(Ek) electron density of states ωq phonon frequency m∗ electron effective mass p′ electron momentum after a scattering event
منابع مشابه
Optimal Scheduling of Battery Energy Storage System in Distribution Network Considering Uncertainties using hybrid Monte Carlo- Genetic Approach
This paper proposes a novel hybrid Monte Carlo simulation-genetic approach (MCS-GA) for optimal operation of a distribution network considering renewable energy generation systems (REGSs) and battery energy storage systems (BESSs). The aim of this paper is to design an optimal charging /discharging scheduling of BESSs so that the total daily profit of distribution company (Disco) can be maximiz...
متن کاملLoss of Load Expectation Assessment in Deregulated Power Systems Using Monte Carlo Simulation and Intelligent Systems
Deregulation policy has caused some changes in the concepts of power systems reliability assessment and enhancement. In this paper, generation reliability is considered, and a method for its assessment using intelligent systems is proposed. Also, because of power market and generators’ forced outages stochastic behavior, Monte Carlo Simulation is used for reliability evaluation. Generation r...
متن کاملA New Model Considering Uncertainties for Power Market
Medium-term modeling of electricity market has essential role in generation expansion planning. On the other hand, uncertainties strongly affect modeling and consequently, strategic analysis of generation firms in the medium term. Therefore, models considering these uncertainties are highly required. Among uncertain variables considered in the medium term generation planning, demand and hyd...
متن کاملCharacterization of Carbon Nanotube (CNT) in Adsorption Gas: Monte Carlo and Langevin Dynamic Simulation
Nanostructures have considerably higher surface areas than their bulk counterparts; thereforesurfaces often play important, sometimes even dominant, roles in the nanostructure properties. Thenanocrystalline and nanotubes have low band gaps and high carrier mobility, thus offeringappealing potential as absorption gas. Interaction between methanol molecules and carbonnanotube is investigated usin...
متن کاملComputer Simulation of Electron and Ion Beam Lithography of Nanostructures
In this paper a review of the authors results on mathematical modeling of the processes at electron or ion beam lithography of nanostructures is presented. Our Monte Carlo simulation tools for electron and ion exposures are successfully applied for the energy deposition calculation at electron or ion lithography of resist layers. At ion lithography electronic energy losses of penetrating electr...
متن کامل